Wafer handling robot

Product features:

1. Adopting a two handed arm structure, it can achieve simultaneous retrieval and placement of two pieces, resulting in higher handling efficiency

2. Curved acceleration and deceleration control system for efficient and high-precision wafer handling

3. Equipped with high-performance motion sensors to ensure high-precision handling and stability

4. Compatible with the handling of 2-inch to 12 inch wafers

5. The base fixation method or flange fixation method can be selected based on the device layout

6. Suitable for vacuum adsorption, bottom support, edge clamping, and Bernoulli non-contact wafer fixation methods

7. Optional finger materials include carbon fiber, aluminum alloy, high-purity ceramics, and more


Product parameters:

Structure

Four axes (private server motor and ABS encoder)

Wafer size 

Suitable for 2-inch to 12 inch wafers

Rated load

2 Kg

Communication control

RS232 and parallel I/O mode

Movable range

Arm 320mm; Rotate 340 degrees; Lift 500mm

Handling speed

Arm 1150 mm/sec; Rotate 270 degrees/sec; Lift 250mm/sec

Repetitive accuracy

±0.1mm

Cleanliness level

Class1

Robot material

aluminium alloy

Finger material

Ceramics, carbon fiber, aluminum alloy

Pressure

Positive pressure of 0.4-0.5MPa; Negative pressure: below -70KPa

Power Supply

AC 200-240V (single-phase)

Wafer fixing method

Vacuum adsorption type, bottom support type, edge clamping type, Bernoulli non-contact type

Application area 

High speed handling of semiconductor wafers in atmospheric environment, various semiconductor equipment, EFEM transfer, adhesive development equipment, cleaning equipment, testing equipment, etc



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